Electron beam lithography at 10 keV using an epoxy based high resolution negative resist

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 1096-1099

  Martin, C ^a   Rius, G ^a   Llobera, A ^a   Voigt, A ^b   Gruetzner, G ^b   Perez Murano F ^a  

^a INSTITUTO DE MICROELECTRÓNICA DE BARCELONA   (Spain)

^b MICRO RESIST TECHNOLOGY GMBH   (Germany)

Author keywords

EBL; Nanopatterning; Negative resist; Polymer technology

Indexed keywords

ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; ELECTRON ENERGY LEVELS; OPTICAL RESOLVING POWER; PATTERNMAKING; REACTIVE ION ETCHING;

NANOPATTERNING; NEGATIVE RESISTS; PATTERN TRANSFER; PHOTO ACID GENERATOR (PAG); POLYMER TECHNOLOGY;

PHOTORESISTS;

EID: 34248189285     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.035     Document Type: Article

References (9)

1. McCord M.A., and Rooks M.J. In: Rai-Choudhury P. (Ed). Handbook of Microlithography, Micromachining, and Microfabrication (1997), SPIE Press, London, UK 139
2. Llobera A., Seidemann V., Plaza J.A., Cadarso V.J., and Buttgenbach S. IEEE Photonics Technology Letters 17 6 (2005) 1262-1264
3. Shaw J.M., Gelorme J.D., LaBianca N.C., Conley W.E., and Holmes S.J. IBM Journal of Research and Development 41 1-2 (1997) 81-94
4. Pepin A., Studer V., Decanini D., and Chen Y. Microelectronic Engineering 73-74 (2004) 233-237
5. Wong W.H., and Pun E.Y.B. Journal of Vacuum Science & Technology B 19 3 (2001) 732-735
6. Aktary M., Jensen M.O., Westra K.L., Brett M.J., and Freeman M.R. Journal of Vacuum Science & Technology B 21 4 (2003) L5-L7
7. P. Carlberg, M. Beck, M. Graczyk, I. Maximov, E.L. Sarwe, L. Montelius, K. Pfeiffer, F. Reuther, G. Gruetzner, in: International Conference on Nanometer-Scale Science and Technology, Malmö, Sweden, June 24-28, 2002, p. TH-P-043.
8. Bogdanov A.L., and Peredkov S.S. Microelectronic Engineering 53 1-4 (2000) 493-496
9. F. Campabadal, S. Ghatnekar-Nilsson, G. Rius, C. Fleta, J.M. Rafi, E. Figueras, J. Esteve, in: Smart Sensors, Actuators, and Mems II, Seville, Spain, May 09-11, 2005, pp. 667-674.