Pore analysis of obliquely deposited nanostructures by krypton gas adsorption at 87 K

Microporous and Mesoporous Materials

Volumn 143, Issue 1, 2011, Pages 166-173

  Krause, Kathleen M ^a   Thommes, Matthias ^b   Brett, Michael J ^a,c  

^a UNIVERSITY OF ALBERTA   (Canada)

^b Quantachrome   (United States)

^c NATIONAL RESEARCH COUNCIL CANADA   (Canada)

Author keywords

Gas adsorption porosimetry; Glancing angle deposition; Krypton; Pore size distribution; Pore volume

Indexed keywords

ADSORPTION POROSIMETRY; COLUMNAR ARRAYS; CONTROL OF MORPHOLOGY; ENERGY SCAVENGING DEVICES; FILM POROSITY; GLANCING ANGLE DEPOSITION; GLANCING ANGLE DEPOSITION TECHNIQUE; HIGH SURFACE AREA; LARGE ASPECT RATIO; MEAN DISTANCES; MESOPOROSITY; NANO-STRUCTURED; NANOROD ARRAYS; NANORODS ARRAYS; PERFORMANCE OF DEVICES; PORE ANALYSIS; PORE VOLUME; POROUS NATURE; SCANNING ELECTRON MICROSCOPY IMAGE; SEM IMAGE; SEM IMAGE ANALYSIS; SILICON DIOXIDE; TIO; TOPDOWN;

AMORPHOUS FILMS; AMORPHOUS SILICON; ASPECT RATIO; CATALYSTS; GAS ADSORPTION; IMAGE ANALYSIS; NANORODS; PORE SIZE; SCANNING ELECTRON MICROSCOPY; SILICA; SILICON COMPOUNDS; SILICON OXIDES; TITANIUM; TITANIUM DIOXIDE;

KRYPTON;

EID: 79955889267     PISSN: 13871811     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.micromeso.2011.02.023     Document Type: Article

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