Aspects of a novel method for the pore size analysis of thin silica films based on krypton adsorption at liquid argon temperature (87.3 K)

Studies in Surface Science and Catalysis

Volumn 165, Issue , 2007, Pages 551-554

  Thommes, Matthias ^a   Nishiyama, Norikazu ^b   Tanaka, Shunsuke ^b  

^a QUANTACHROME INSTRUMENTS   (United States)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 35148846550     PISSN: 01672991     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S0167-2991(07)80382-X     Document Type: Chapter

References (6)

1. Thommes M. In: Lu M., and Zhao X.S. (Eds). Nanoporous Materials Science and Engineering (2004), World Scientific 317
2. Thommes M., Köhn R., and Fröba M. J. Phys. Chem. B 104 (2000) 7932
3. (a) M. Thommes, E-MRS 2005 spring meeting, Symposium E, Poster PI-45; (b) M. Thommes et al, manuscript in preparation, (2006).
4. in press. Hung F., Coasne B., Gubbins K., Siperstein F., Thommes M., and Sliwinska-Barkowiak M. Studies in Surface Science and Catalysis (2006)
5. Morishige K., Kawano K., and Hayashigi T. J. Phys. Chem. B 104 (2000) 102898
6. Oku Y., Nishiyama N., Tanaka S., Ueyama K., Hata N., and Kikkawa T. Mater. Res. Soc Symp. Proc 716 (2002) 587