Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 316-323

  Lintymer, J ^a   Gavoille, J ^a   Martin, N ^a   Takadoum, J ^a  

^a Centre National de la Recherche Scientifique   (France)

Author keywords

Chromium; Conductivity; Grain boundary; Nano indentation; Roughness

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHROMIUM; COATINGS; CRYSTALLOGRAPHY; ELECTRIC CONDUCTIVITY; INDENTATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SURFACES; X RAY DIFFRACTION ANALYSIS;

GLANCING ANGLE DEPOSITION (GLAD);

THIN FILMS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 18344413022     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00413-4     Document Type: Article

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