Optimized fabrication of high-quality La0.67Sr 0.33MnO3 thin films considering all essential characteristics

Journal of Physics D: Applied Physics

Volumn 44, Issue 20, 2011, Pages

  Boschker, H ^a   Huijben, M ^a   Vailionis, A ^b,c   Verbeeck, J ^d   Van Aert, S ^d   Luysberg, M ^e   Bals, S ^d   Van Tendeloo, G ^d   Houwman, E P ^a   Koster, G ^a   Blank, D H A ^a   Rijnders, G ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b STANFORD UNIVERSITY   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^d UNIVERSITY OF ANTWERP   (Belgium)

^e FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; DEVICE PERFORMANCE; ESSENTIAL CHARACTERISTIC; HIGH QUALITY; HIGH-QUALITY FILMS; LSMO FILMS; RESIDUAL RESISTIVITY; SCANNING TRANSMISSION ELECTRON MICROSCOPY; TRANSPORT MEASUREMENTS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DEPOSITION; DIFFRACTION; HIGH ENERGY ELECTRON DIFFRACTION; MANGANESE; MANGANESE OXIDE; OPTIMIZATION; PHOTOELECTRON SPECTROSCOPY; PULSED LASER DEPOSITION; SURFACE SEGREGATION; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

SATURATION MAGNETIZATION;

EID: 79955856395     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/20/205001     Document Type: Article

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