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European Physical Journal B

Volumn 51, Issue 3, 2006, Pages 337-340

High-quality in situ manganite thin films by pulsed laser deposition at low background pressures

(6) Tebano, A a Balestrino, G a Boggio, N G a Aruta, C a Davidson, B b Medaglia, P G a

a UNIVERSITY OF ROME TOR VERGATA (Italy)

b LABORATORIO TASC (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; DIFFRACTION; MANGANESE COMPOUNDS; OXIDATION; PULSED LASER DEPOSITION; THIN FILMS;

FILM OXIDATION; MANGANITE THIN FILMS; OXYGEN PRESSURE; PLUME-BACKGROUND INTERACTIONS;

METALLIC FILMS;

EID: 33745468322 PISSN: 14346028 EISSN: 14346036 Source Type: Journal
DOI: 10.1140/epjb/e2006-00238-2 Document Type: Article

Times cited : (23)

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