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Volumn 95, Issue 11 II, 2004, Pages 7324-7326

Epitaxial diodes of a half-metallic ferromagnet on an oxide semiconductor

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC PROPERTIES; ELECTRON TUNNELING; EPITAXIAL GROWTH; FERROMAGNETIC MATERIALS; LANTHANUM COMPOUNDS; MAGNETIC LEAKAGE; PULSED LASER DEPOSITION; SEMICONDUCTOR MATERIALS; THIN FILMS; TITANIUM DIOXIDE;

EID: 2942637754     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1669255     Document Type: Conference Paper
Times cited : (52)

References (17)
  • 10
    • 0142039865 scopus 로고    scopus 로고
    • and references therein
    • R. Jansen, J. Phys. D 36, R289 (2003), and references therein.
    • (2003) J. Phys. D , vol.36
    • Jansen, R.1
  • 17
    • 2942632616 scopus 로고    scopus 로고
    • note
    • For the 0.1 wt. % doped STO at T>250 K the I-V curve does not contain a sufficiently large exponential portion, such that no reliable value of n and Schottky barrier height could be extracted.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.