SCOPUS 정보 검색 플랫폼

Volumn 52, Issue 3, 2011, Pages 554-559

Polycrystalline TiO2 thin films with different thicknesses deposited on unheated substrates using RF magnetron sputtering

(2) Wei, Ching Hua a Chang, Ching Min a

a SOUTHERN TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY (Taiwan)

Author keywords

Film thickness; Sputtering; Surface morphology; Titanium dioxide

Indexed keywords

ABSORPTION EDGES; ATOMIC FORCE MICROSCOPES; CRYSTALLINE PARTICLE SIZE; CRYSTALLINE STRUCTURE; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; GLASS SUBSTRATES; NANO-CRYSTALLINE STRUCTURES; PLASMA PARTICLES; POLYCRYSTALLINE; POLYCRYSTALLINE PHASIS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; RUTILE PHASIS; TIO; UNHEATED SUBSTRATES; UV-VIS SPECTROPHOTOMETERS; X RAY DIFFRACTOMETERS; XRD;

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; DIES; ITO GLASS; MAGNETRON SPUTTERING; MORPHOLOGY; OPTICAL PROPERTIES; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; THICK FILMS; THIN FILMS; TITANIUM; TITANIUM DIOXIDE;

SUBSTRATES;

EID: 79955767523 PISSN: 13459678 EISSN: None Source Type: Journal
DOI: 10.2320/matertrans.M2010358 Document Type: Conference Paper

Times cited : (49)

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