Investigation of the effects of pumping speed and Ar/O2 ratio on the transient time at mode transition in Ti-O2 reactive sputtering

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 423-426

  Kusano, E ^a   Kinbara, A ^a  

^a KANAZAWA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Deposition process; Glow discharge; Sputtering

Indexed keywords

ADSORPTION; ARGON; DEPOSITION; GLOW DISCHARGES; OXYGEN; SPUTTERING; TITANIUM;

DISCHARGE VOLTAGE; EMISSION INTENSITY; FLOW RATE RATIO; PUMPING SPEED; REACTIVE GAS PARTIAL PRESSURE; REACTIVE SPUTTERING; TIME DEPENDENT PROCESS; TRANSIENT TIME;

SURFACE PHENOMENA;

EID: 0030218724     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08665-8     Document Type: Article

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