Preparation and characterization of transparent conducting ZnO:W films by DC magnetron sputtering

Journal of Semiconductors

Volumn 32, Issue 4, 2011, Pages

  Zhang, Huafu ^a   Yang, Shugang ^a   Liu, Hanfa ^a   Yuan, Changkun ^a  

^a SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

deposition pressure; magnetron sputtering; transparent conducting films; Tungsten doped zinc oxide

Indexed keywords

C-AXIS ORIENTATIONS; CRYSTALLINITIES; DC MAGNETRON SPUTTERING; DEPOSITED FILMS; DEPOSITION PRESSURES; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; HEXAGONAL STRUCTURES; HIGH TRANSMITTANCE; LOW RESISTIVITY; LOW TEMPERATURES; OPTICAL TRANSMITTANCE; POLYCRYSTALLINE; SPUTTERING POWER; TRANSPARENT CONDUCTING FILMS; VISIBLE RANGE; ZNO;

DC POWER TRANSMISSION; DEPOSITION; ELECTRIC CONDUCTIVITY; ELECTRIC RESISTANCE; FILM PREPARATION; MAGNETRON SPUTTERING; ORGANIC POLYMERS; OXIDE FILMS; REFRACTIVE INDEX; SUBSTRATES; TUNGSTEN; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

CONDUCTIVE FILMS;

EID: 79955633018     PISSN: 16744926     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-4926/32/4/043002     Document Type: Article

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