Influence of the distance between target and substrate on the properties of transparent conducting Al-Zr co-doped zinc oxide thin films

Journal of Semiconductors

Volumn 30, Issue 11, 2009, Pages

  Zhang, Huafu ^a   Liu, Hanfa ^a   Zhou, Aiping ^a   Yuan, Changkun ^a  

^a SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Al Zr co doped zinc oxide films; Distance between target and substrate; Magnetron sputtering; Transparent conducting films

Indexed keywords

AL-ZR CO-DOPED ZINC OXIDE FILMS; CO-DOPED; CRYSTALLINITIES; DEPOSITED FILMS; DIRECT CURRENT MAGNETRON SPUTTERING; DISTANCE BETWEEN TARGET AND SUBSTRATE; ELECTRICAL RESISTIVITY; GLASS SUBSTRATES; HEXAGONAL STRUCTURES; POLYCRYSTALLINE; PREFERRED ORIENTATIONS; ROOM TEMPERATURE; TRANSPARENT CONDUCTING FILMS; VISIBLE RANGE;

ALUMINUM; CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; MAGNETRONS; SUBSTRATES; TARGETS; THIN FILMS; ZINC; ZINC OXIDE; ZIRCONIUM;

OXIDE FILMS;

EID: 71249146329     PISSN: 16744926     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-4926/30/11/113002     Document Type: Article

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