Hybrid functional IrO2-TiO2 thin film resistor prepared by atomic layer deposition for thermal inkjet printheads

Transactions of Nonferrous Metals Society of China (English Edition)

Volumn 21, Issue SUPPL. 1, 2011, Pages

  Kwack, Won Sub ^a   Moon, Hyoung Seok ^b   Jeong, Seong Jun ^b   Wang, Qi Min ^a   Kwon, Se Hun ^a  

^a Pusan National University   (South Korea)

^b Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

heating resistor; inkjet; IrO2 TiO2 film

Indexed keywords

ANNEALING PROCESS; COMPOSITE THIN FILMS; HEATER RESISTORS; INKJET; IRO2-TIO2 FILM; LOW TEMPERATURE COEFFICIENTS; STEP-STRESS; THERMAL INKJET; THERMAL INKJET PRINTHEAD; THIN FILM RESISTORS; TIO; TITANIUM ISOPROPOXIDE;

ATOMIC LAYER DEPOSITION; COMPOSITE FILMS; DEPOSITION; HEATING; IRIDIUM; RESISTORS; TANTALUM COMPOUNDS; THERMAL PRINTING; THIN FILMS; TITANIUM; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 79955581602     PISSN: 10036326     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1003-6326(11)61067-4     Document Type: Article

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