Characterization of hafnium diboride thin film resistors by r.f. magnetron sputtering

Materials Chemistry and Physics

Volumn 45, Issue 2, 1996, Pages 163-166

  Wuu, D S ^a   Lee, M L ^a   Lin, T Y ^a   Horng, R H ^b  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b DA YEH UNIVERSITY   (Taiwan)

Author keywords

Hafnium diboride; Ink jet printing devices; R.f. magnetron sputtering; Thin film resistors

Indexed keywords

BORIDE COATINGS; BORIDES; ELECTRIC CONDUCTIVITY; HAFNIUM COMPOUNDS; INK; MAGNETRON SPUTTERING; RESISTORS; THERMAL PRINTING;

HAFNIUM DIBORIDE; INK-JET PRINTING DEVICES; THIN FILM RESISTORS;

THIN FILM DEVICES;

EID: 0030212855     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/0254-0584(96)80096-4     Document Type: Article

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