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Volumn 92, Issue 18, 2008, Pages

Controlling the temperature coefficient of resistance and resistivity in Ru O2 -Ti O2 thin films by the intermixing ratios between Ru O2 and Ti O2

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; RUTHENIUM COMPOUNDS; THERMAL CONDUCTIVITY; THERMODYNAMIC STABILITY; THIN FILMS; TITANIUM OXIDES;

EID: 43349097919     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2918989     Document Type: Article
Times cited : (13)

References (13)
  • 1
    • 2542473798 scopus 로고    scopus 로고
    • Recent Progress in Ink Jet Technologies II, edited by E. Hanson (IS&T, Springfield, VA)
    • R. R. Allen, Recent Progress in Ink Jet Technologies II, edited by, E. Hanson, (IS&T, Springfield, VA, 1999), pp. 114-120.
    • (1999) , pp. 114-120
    • Allen, R.R.1
  • 2
    • 41649091199 scopus 로고    scopus 로고
    • Proceedings of the first IEEE International Conference on Nano/Micro Engineered and Molecular Systems, Zhuhai, China, (unpublished)
    • J. C. Liou and F. G. Tseng, Proceedings of the first IEEE International Conference on Nano/Micro Engineered and Molecular Systems, Zhuhai, China, 2006 (unpublished), pp. 368-372.
    • (2006) , pp. 368-372
    • Liou, J.C.1    Tseng, F.G.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.