Combined AFM nano-machining and reactive ion etching to fabricate high aspect ratio structures

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 11, 2010, Pages 7287-7290

  Peng, Ping ^a   Shi, Tielin ^b   Liao, Guanglan ^b   Tang, Zirong ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

^b HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

AFM; Nano machining; RIE; Template

Indexed keywords

AFM; ALUMINUM FILM; ATOMIC FORCE MICROSCOPES; COMBINED METHOD; DIAMOND TIP; E-BEAM LITHOGRAPHY; ELASTIC-PLASTIC; FABRICATED STRUCTURES; HIGH ASPECT RATIO STRUCTURES; LOWER COST; MACHINING CONDITIONS; MATERIAL PROPERTY; NANO FABRICATION; NANO IMPRINT; NANO MACHINING; NANO SCRATCH; RIE; SCRATCH LOAD; SEM; SILICON SUBSTRATES; SUBMICRON; SUBMICRON SCALE; TEMPLATE; TEMPLATE FABRICATION;

ALUMINUM; ALUMINUM COATINGS; ASPECT RATIO; ATOMIC FORCE MICROSCOPY; FABRICATION; MACHINING; METALLIC FILMS; NANOIMPRINT LITHOGRAPHY; STICTION; STRAIN HARDENING; SUPPORTS;

REACTIVE ION ETCHING;

EID: 79955526382     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2858     Document Type: Conference Paper

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