Optimized electron beam writing strategy for fabricating computer-generated holograms based on an effective medium approach

Optics Express

Volumn 19, Issue 9, 2011, Pages 8684-8692

  Freese, Wiebke ^a   Kämpfe, Thomas ^a   Rockstroh, Werner ^a   Kley, Ernst Bernhard ^a   Tünnermann, Andreas ^a  

^a FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; HOLOGRAMS; LITHOGRAPHY; OPTIMIZATION;

COMPUTER GENERATED HOLOGRAMS; EFFECTIVE MEDIUM; ELECTRON BEAM WRITING; LARGE-SCALE APPLICATIONS; PATTERNING PROCESS; PHASE LEVELS; SUB-WAVELENGTH; SUB-WAVELENGTH STRUCTURES; VISIBLE RANGE;

COMPUTER GENERATED HOLOGRAPHY;

ARTICLE; ELECTRON; EQUIPMENT; EQUIPMENT DESIGN; HOLOGRAPHY; INFORMATION PROCESSING; INSTRUMENTATION; METHODOLOGY; PHOTOGRAPHY;

DATA COMPRESSION; ELECTRONS; EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; HOLOGRAPHY; PHOTOGRAPHY;

EID: 79955374236     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.19.008684     Document Type: Article

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