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Volumn 40, Issue 32, 2001, Pages 5852-5859

Efficient beam shaping of linear, high-power diode lasers by use of micro-optics

Author keywords

[No Author keywords available]

Indexed keywords

ANTIREFLECTION COATINGS; DIFFRACTIVE OPTICS; HIGH POWER LASERS; LIGHT REFRACTION; MICROOPTICS; PHOTORESISTS;

EID: 0038149434     PISSN: 1559128X     EISSN: 21553165     Source Type: Journal    
DOI: 10.1364/AO.40.005852     Document Type: Article
Times cited : (24)

References (13)
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  • 3
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    • Kopp, C.1    Ravel, L.2    Meyrueis, P.3
  • 5
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    • Beam shaping of high-power laser diode arrays by continuous surface-relief elements
    • P. Ehbets, H. P. Herzig, R. Dandliker, P. Regnault, and I. Kjelberg, “Beam shaping of high-power laser diode arrays by continuous surface-relief elements,” J. Mod. Opt. 40, 637-645 (1993).
    • (1993) J. Mod. Opt. , vol.40 , pp. 637-645
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  • 8
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    • Diffractive Optics for Industrial and Commercial Applications, J. Turunen and F. Wyrowski, eds. (Akademie-Verlag, Berlin,), Chap. 4
    • M. T. Gale and M. Rossi, “Continuous-relief diffractive lenses and microlens arrays,” in Diffractive Optics for Industrial and Commercial Applications, J. Turunen and F. Wyrowski, eds. (Akademie-Verlag, Berlin, 1997), Chap. 4.
    • (1997) Continuous-Relief Diffractive Lenses and Microlens Arrays
    • Gale, M.T.1    Rossi, M.2
  • 9
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    • Fabrication of continuous-relief micro-optics: Progress in laser writing and replication technology
    • OSA Technical Digest Series (Optical Society of America, Washington, D.C
    • M. T. Gale, Th. Hessler, R. E. Kunz, and H. Teichmann, “Fabrication of continuous-relief micro-optics: progress in laser writing and replication technology,” in Diffractive Optics and Microoptics, Vol. 5 of 1996 OSA Technical Digest Series (Optical Society of America, Washington, D.C., 1996), p. 335.
    • (1996) Diffractive Optics and Microoptics , vol.5 , pp. 335
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  • 10
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    • Binary optics fabrication
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    • General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask
    • W. Daschner, C. Wu, and S. H. Lee, “General aspheric refractive micro-optics fabricated by optical lithography using a high energy beam sensitive glass gray-level mask,” J. Vac. Sci. Technol. B 14, 135-138 (1996).
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    • Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass
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