SCOPUS 정보 검색 플랫폼

Volumn 509, Issue 20, 2011, Pages

Enhanced piezoelectric properties of Ta substituted-(K0.5Na 0.5)NbO3 films: A candidate for lead-free piezoelectric thin films

(9) Lee, Sun Young a Ahn, Chang Won a Kim, Jin Soo a Ullah, Aman a Lee, Hai Joon a Hwang, Hak In b Choi, Jin Sik c Park, Bae Ho c Kim, Ill Won a

a University of Ulsan (South Korea)

b Korea Electronic Technology Institute (KETI) (South Korea)

c Konkuk University (South Korea)

Author keywords

Chemical solution deposition; KNN thin film; Lead free; Piezoelectric; Ta substitution

Indexed keywords

CHEMICALS; DEPOSITION; LEAKAGE CURRENTS; NIOBIUM COMPOUNDS; PEROVSKITE; PIEZOELECTRICITY; SINGLE CRYSTALS; SODIUM COMPOUNDS; X RAY DIFFRACTION;

CHEMICAL SOLUTION DEPOSITION; LEAD-FREE; LEAD-FREE PIEZOELECTRIC THIN FILM; PIEZOELECTRIC; PIEZOELECTRIC COEFFICIENT; PIEZOELECTRIC HYSTERESIS LOOPS; PIEZOELECTRIC PROPERTY; POLYMORPHIC PHASE TRANSITION;

THIN FILMS;

EID: 79954420336 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2011.03.031 Document Type: Letter

Times cited : (39)

References (30)

1
- 0003999843
- Academic New York
- B. Jaffe, W.R. Cook, and H. Jaffe Piezoelectric Ceramics 1971 Academic New York
- (1971) Piezoelectric Ceramics
- Jaffe, B.¹ Cook, W.R.² Jaffe, H.³

2
- 34848918436
- J.G. Wu, Y.Y. Wang, D.Q. Xiao, J.G. Zhu, and Z.H. Pu Appl. Phys. Lett. 91 2007 132914
- (2007) Appl. Phys. Lett. , vol.91 , pp. 132914
- Wu, J.G.¹ Wang, Y.Y.² Xiao, D.Q.³ Zhu, J.G.⁴ Pu, Z.H.⁵

3
- 33845229542
- S.J. Zhang, R. Xia, T.R. Shrout, Z. Zang, and J.F. Wang J. Appl. Phys. 100 2006 104108
- (2006) J. Appl. Phys. , vol.100 , pp. 104108
- Zhang, S.J.¹ Xia, R.² Shrout, T.R.³ Zang, Z.⁴ Wang, J.F.⁵

4
- 10044267852
- Y. Guo, K. Kakimoto, and H. Ohsato Appl. Phys. Lett. 85 2004 4121
- (2004) Appl. Phys. Lett. , vol.85 , pp. 4121
- Guo, Y.¹ Kakimoto, K.² Ohsato, H.³

5
- 39149092031
- D. Lin, K.W. Kwok, and H.L.W. Chan Appl. Phys. A 91 2008 167
- (2008) Appl. Phys. A , vol.91 , pp. 167
- Lin, D.¹ Kwok, K.W.² Chan, H.L.W.³

6
- 57749174087
- Y.G. Lv, C.L. Wang, J.L. Zhang, L. Wu, M.L. Zhao, and J.P. Xu Mater. Res. Bull. 44 2009 284
- (2009) Mater. Res. Bull. , vol.44 , pp. 284
- Lv, Y.G.¹ Wang, C.L.² Zhang, J.L.³ Wu, L.⁴ Zhao, M.L.⁵ Xu, J.P.⁶

7
- 34548011958
- D. Lin, K.W. Kwok, and H.L.W. Chan J. Appl. Phys. 102 2007 034102
- (2007) J. Appl. Phys. , vol.102 , pp. 034102
- Lin, D.¹ Kwok, K.W.² Chan, H.L.W.³

8
- 33947310922
- B.-Q. Ming, J.-F. Wang, P. Qi, and G.-Z. Zang J. Appl. Phys. 101 2007 054103
- (2007) J. Appl. Phys. , vol.101 , pp. 054103
- Ming, B.-Q.¹ Wang, J.-F.² Qi, P.³ Zang, G.-Z.⁴

9
- 70450185077
- C.W. Ahn, S.Y. Lee, H.J. Lee, A. Ullah, J.S. Bae, E.D. Jeong, J.S. Choi, B.H. Park, and I.W. Kim J. Phys. D: Appl. Phys. 42 2009 215304
- (2009) J. Phys. D: Appl. Phys. , vol.42 , pp. 215304
- Ahn, C.W.¹ Lee, S.Y.² Lee, H.J.³ Ullah, A.⁴ Bae, J.S.⁵ Jeong, E.D.⁶ Choi, J.S.⁷ Park, B.H.⁸ Kim, I.W.⁹

10
- 77956046104
- L. Wang, W. Ren, P. Shi, X. Chen, X. Wu, and X. Yao Appl. Phys. Lett. 97 2010 072902
- (2010) Appl. Phys. Lett. , vol.97 , pp. 072902
- Wang, L.¹ Ren, W.² Shi, P.³ Chen, X.⁴ Wu, X.⁵ Yao, X.⁶

11
- 73649144568
- M. Abazari, T. Choi, S.-W. Cheong, and A. Safari J. Phys. D: Appl. Phys. 43 2010 025405
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 025405
- Abazari, M.¹ Choi, T.² Cheong, S.-W.³ Safari, A.⁴

12
- 79954426623
- N. Kondo, W. Sakamoto, B.-Y. Lee, T. Iijima, J. Kumagai, M. Moriya, and T. Yogo Jpn. J. Appl. Phys. 49 09 2010 MA04
- (2010) Jpn. J. Appl. Phys. , vol.49 , Issue.9
- Kondo, N.¹ Sakamoto, W.² Lee, B.-Y.³ Iijima, T.⁴ Kumagai, J.⁵ Moriya, M.⁶ Yogo, T.⁷

13
- 20544467162
- M. Matsubara, K. Kikuta, and S. Hirano J. Appl. Phys. 97 2005 114105
- (2005) J. Appl. Phys. , vol.97 , pp. 114105
- Matsubara, M.¹ Kikuta, K.² Hirano, S.³

14
- 57049147976
- C.W. Ahn, E.D. Jeong, S.Y. Lee, H.J. Lee, S.H. Kang, and I.W. Kim Appl. Phys. Lett. 93 2008 212905
- (2008) Appl. Phys. Lett. , vol.93 , pp. 212905
- Ahn, C.W.¹ Jeong, E.D.² Lee, S.Y.³ Lee, H.J.⁴ Kang, S.H.⁵ Kim, I.W.⁶

15
- 11744273338
- K. Okazaki, and K. Nagata J. Soc. Mater. Sci. Jpn. 4 1972 404
- (1972) J. Soc. Mater. Sci. Jpn. , vol.4 , pp. 404
- Okazaki, K.¹ Nagata, K.²

16
- 0001434342
- C.-R. Cho, J.-H. Koh, and A. Grishin Appl. Phys. Lett. 76 2000 1761
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1761
- Cho, C.-R.¹ Koh, J.-H.² Grishin, A.³

17
- 0037433359
- G.A. Samara J. Phys.: Condens. Matter 15 2003 R367
- (2003) J. Phys.: Condens. Matter , vol.15 , pp. 367
- Samara, G.A.¹

18
- 33746085986
- J.S. Kim, I.R. Hwnag, S.H. Hong, J.H. Lee, B.H. Park, A.C. Woo, and N. Sahn J. Korean Phys. Soc. 48 2006 1583
- (2006) J. Korean Phys. Soc. , vol.48 , pp. 1583
- Kim, J.S.¹ Hwnag, I.R.² Hong, S.H.³ Lee, J.H.⁴ Park, B.H.⁵ Woo, A.C.⁶ Sahn, N.⁷

19
- 55349107535
- R. Herdier, M. Detalle, D. Jenkins, C. Soyer, and D. Remiens Sens. Actuators A 148 2008 122
- (2008) Sens. Actuators A , vol.148 , pp. 122
- Herdier, R.¹ Detalle, M.² Jenkins, D.³ Soyer, C.⁴ Remiens, D.⁵

20
- 0000599498
- L. Kholkin, M.L. Calzada, P. Ramos, J. Mendiola, and N. Setter Appl. Phys. Lett. 69 1996 3602
- (1996) Appl. Phys. Lett. , vol.69 , pp. 3602
- Kholkin, L.¹ Calzada, M.L.² Ramos, P.³ Mendiola, J.⁴ Setter, N.⁵

21
- 77956540021
- M. Sucwattana, and D.J. Singh Phys. Rev. 82 2010 014114
- (2010) Phys. Rev. , vol.82 , pp. 014114
- Sucwattana, M.¹ Singh, D.J.²

22
- 0037289708
- K. Yao, and F.E.H. Tay IEEE Trans. Ultrason. Ferroelect. Freq. Control 50 2003 113
- (2003) IEEE Trans. Ultrason. Ferroelect. Freq. Control , vol.50 , pp. 113
- Yao, K.¹ Tay, F.E.H.²

23
- 0035584168
- V.G. Koukhar, N.A. Pertsev, and R. Waser Phys. Rev. B 64 2001 214103
- (2001) Phys. Rev. B , vol.64 , pp. 214103
- Koukhar, V.G.¹ Pertsev, N.A.² Waser, R.³

24
- 0242304155
- L. Chen, V. Nagarajan, R. Ramesh, and A.L. Roytburd J. Appl. Phys. 94 2003 5147
- (2003) J. Appl. Phys. , vol.94 , pp. 5147
- Chen, L.¹ Nagarajan, V.² Ramesh, R.³ Roytburd, A.L.⁴

25
- 0001175356
- A.L. Kholkin, K.G. Brooks, and N. Setter Appl. Phys. Lett. 71 1997 2044
- (1997) Appl. Phys. Lett. , vol.71 , pp. 2044
- Kholkin, A.L.¹ Brooks, K.G.² Setter, N.³

26
- 0037451246
- H. Maiwa, N. Iizawa, D. Togawa, T. Hayashi, W. Sakamoto, M. Yamada, and S. Hirano Appl. Phys. Lett. 82 2003 821760
- (2003) Appl. Phys. Lett. , vol.82 , pp. 821760
- Maiwa, H.¹ Iizawa, N.² Togawa, D.³ Hayashi, T.⁴ Sakamoto, W.⁵ Yamada, M.⁶ Hirano, S.⁷

27
- 62149084043
- H.J. Lee, I.W. Kim, J.S. Kim, C.W. Ahn, and B.H. Park Appl. Phys. Lett. 94 2009 092902
- (2009) Appl. Phys. Lett. , vol.94 , pp. 092902
- Lee, H.J.¹ Kim, I.W.² Kim, J.S.³ Ahn, C.W.⁴ Park, B.H.⁵

28
- 33847707344
- T.A. Berfield, R.J. Ong, D.A. Payne, and N.R. Sottos J. Appl. Phys. 101 2007 024102
- (2007) J. Appl. Phys. , vol.101 , pp. 024102
- Berfield, T.A.¹ Ong, R.J.² Payne, D.A.³ Sottos, N.R.⁴

29
- 0000950824
- L. Lian, and N.R. Sottos J. Appl. Phys. 87 2000 3941
- (2000) J. Appl. Phys. , vol.87 , pp. 3941
- Lian, L.¹ Sottos, N.R.²

30
- 34247352845
- S.R. Kumar, S. Habouti, V. Zaporojtchenko, and M. Es-Souni J. Sol-Gel Sci. Technol. 42 2007 309
- (2007) J. Sol-Gel Sci. Technol. , vol.42 , pp. 309
- Kumar, S.R.¹ Habouti, S.² Zaporojtchenko, V.³ Es-Souni, M.⁴

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