Homogeneity characterization of lattice spacing of silicon single crystals by a self-referenced lattice comparator

Metrologia

Volumn 48, Issue 2, 2011, Pages

  Fujimoto, H ^a   Waseda, A ^a   Zhang, X W ^b  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AVOGADRO CONSTANT; DIFFERENT ORIGINS; LATTICE SPACING; SILICON SINGLE CRYSTALS; STANDARD DEVIATION; STANDARD UNCERTAINTY;

METAL CASTINGS; MONOCRYSTALLINE SILICON; SILICON WAFERS;

SINGLE CRYSTALS;

EID: 79953701680     PISSN: 00261394     EISSN: 16817575     Source Type: Journal    
DOI: 10.1088/0026-1394/48/2/S09     Document Type: Article

References (9)

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4. -9 AIP Conf. Proc. 1234 895-8
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