Vapor deposited release layers for nanoimprint lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6151 I, Issue , 2006, Pages

  Zhang, Tong ^a   Kobrin, Boris ^a   Wanebo, Mike ^a   Nowak, Romek ^a   Yi, Richard ^a   Chinn, Jeff ^a   Bender, Markus ^b   Fuchs, Andreas ^b   Otto, Martin ^c  

^a Applied Microstructures Inc   (United States)

^b AMO GMBH   (Germany)

^c RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Anti stiction; Nano imprint lithography; Nanotechnology; NIL; Release layer; Self assembled monolayer; Vapor phase deposition

Indexed keywords

COATINGS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; PLASTIC FILMS; SELF ASSEMBLY; SILANES; VAPOR DEPOSITION;

MOLECULAR VAPOR DEPOSITION; NANOIMPRINT LITHOGRAPHY; NANOSCALE TOPOGRAPHY; ROOM TEMPERATURE;

NANOTECHNOLOGY;

EID: 33745617380     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.654658     Document Type: Conference Paper

References (6)

1. Molecular Vapor Deposition (MVD) is a trademark of Applied MicroStructures, Inc.
2. B. Kobrin, W. R. Ashurst, R. Maboudian, V. Fuentes, R. Nowak, R. Yi and J. Chinn, "MVD technique of surface modification", AICHE Annual meeting 2004, November 8, Austin, TX
3. B. Kobrin, J. Chinn, R. Ashurst, "Durable Anti-Stiction Coatings by Molecular Vapor Deposition (MVD)", NSTI Nanotech 2005, May 8-12, Anaheim, CA
4. Gun-Yong Jung, Zhiyong Li, Wei Wu, etc. "Vapor-Phase Self-Assembled Monolayer for Improved Mold Release in Nanoimprint Lithography", Langmuir, 21, 1156-1161, 2005
5. M. Bender, M. Otto, B. Hadam, B. Spangenberg, H. Kurz "Multiple Imprinting in UV based Nanoimprint Lithography: Related Material Issues", Microelectronic Eng. 61-62:407, 2002
6. J. Beauvais, A. Zanal, E. Lavallee, Mike Waneno, etc., "Faithful replication ? Metrology comparison for raised/recessed features with UV-NIL", MNE2005 Abstract, 2005