Investigation of SiO2 layers by glow discharge optical emission spectroscopy including layer thickness determination by an optical interference effect

Journal of analytical atomic spectrometry

Volumn 15, Issue 7, 2000, Pages 873-876

  Dorka, Roland ^a   Kunze, Reinhard ^a   Hoffmann, Volker ^a  

^a IFW DRESDEN   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELLIPSOMETRY; GLOW DISCHARGES; LIGHT EMISSION; LIGHT INTERFERENCE; SILICA; SILICON WAFERS;

GLOW DISCHARGE OPTICAL EMISSION SPECTROMETRY (GD-OES);

EMISSION SPECTROSCOPY;

EID: 0033726409     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b000905i     Document Type: Article

References (5)

1. V. Hoffmann, H.-J. Uhlemann, F. Präßler, K. Wetzig and D. Birus, Fresenius' J Anal. Chem., 1996, 355, 826.
2. Th. Nelis and R. Payling, 4th European Workshop on Analytical Glow Discharge Spectrometry, Dortmund, October 9-10, 1997.
3. V. Hoffmann, K. Kurt, K. Kämmer, R. Thielsch, Th. Wirth and U. Beck, Appl. Spectrosc., 1999, 53(8), 987.
4. Handbook of optical constants of solids, ed. by E. D. Palik, Academic Press, 1998.
5. M. L. Hartenstein and R. K. Marcus, Surf. Interface Anal., 1999, 27, 962.