Reduction of interlayer thickness by low-temperature deposition of Mo/Si multilayer mirrors for X-ray reflection

Applied Surface Science

Volumn 257, Issue 14, 2011, Pages 6251-6255

  De Rooij Lohmann, V I T A ^a   Yakshin, A E ^a   Zoethout, E ^a   Verhoeven, J ^b   Bijkerk, F ^a,c  

^a FOM INSTITUTE FOR PLASMA PHYSICS RIJNHUIZEN   (Netherlands)

^b LEIDEN UNIVERSITY   (Netherlands)

^c UNIVERSITY OF TWENTE   (Netherlands)

Author keywords

Cryogenic deposition; Interlayer thickness; Mo Si multilayers

Indexed keywords

COMPOSITE FILMS; CRYOGENICS; DEPOSITION; SURFACE SEGREGATION; TEMPERATURE;

ELECTRON BEAM EVAPORATION; INTERLAYER THICKNESS; LOW TEMPERATURES; LOW-TEMPERATURE DEPOSITION; MO/SI MULTILAYER; MULTILAYER OPTICS; ROOM TEMPERATURE DEPOSITION; THIN INTERLAYERS;

MULTILAYERS;

EID: 79953025593     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.02.054     Document Type: Article

References (19)

1. S. Bajt, J.B. Alameda, T.W. Barbee, W.M. Clift, J.A. Folta, B. Kaufmann, and E.A. Spiller Optical Engineering 41 2002 1797
2. I. Nedelcu, R.W.E. van de Kruijs, A.E. Yakshin, and F. Bijkerk Applied Optics 48 2009 155
3. I. Nedelcu, R.W.E. van de Kruijs, A.E. Yakshin, F. Tichelaar, E. Zoethout, E. Louis, H. Enkisch, S. Muellender, and F. Bijkerk Thin Solid Films 515 2006 434
4. A.E. Yakshin, E. Louis, P.C. Görts, E.L.G. Maas, and F. Bijkerk Physica B: Condensed Matter 283 2000 143
5. S. Bajt, D.G. Stearns, and P.A. Kearney Journal of Applied Physics 90 2001 1017
6. J.M. Slaughter, A. Shapiro, P.A. Kearney, and C.M. Falco Physical Review B 44 1991 3854
7. F.R. de Boer, R. Boom, W.C.M. Mattens, A.R. Miedema, and A.K. Niessen Cohesion in Metals. Transition Metal Alloys 1988 North-Holland
8. M. Niibe, M. Hayashida, T. Iizuka, A. Miyake, Y. Watanabe, R. Takahashi, and Y. Fukuda X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, vol. 1343 SPIE, San Diego, CA, USA 1991 2
9. S. Ogura, M. Niibe, Y. Watanabe, M. Hayashida, and T. Iizuka E. Christensen, X-Ray Multilayers for Diffractometers, Monochromators, and Spectrometers 984 1988 SPIE San Diego, CA, USA 140
10. S. Bruijn, R.W.E. van de Kruijs, A.E. Yakshin, and F. Bijkerk Applied Surface Science 257 2011 2707
11. I. Nedelcu, R.W.E. van de Kruijs, A.E. Yakshin, and F. Bijkerk Physical Review B 76 2007 245404
12. R. Cuerno, M. Castro, J. Munoz-Garcia, R. Gago, and L. Vazquez European Physical Journal-Special Topics 146 2007 427
13. D.L. Windt, IMD version 4.1, 1998.
14. B.D. Cullity, and S.R. Stock Elements of X-Ray Diffraction 2001 Upper Saddle River, NJ Prentice Hall p. 664
15. P. Reinig, F. Fenske, W. Fuhs, A. Schöpke, and B. Selle Applied Surface Science 210 2003 301
16. A.K. Petford-Long, M.B. Stearns, C.H. Chang, S.R. Nutt, D.G. Stearns, N.M. Ceglio, and A.M. Hawryluk Journal of Applied Physics 61 1987 1422
17. M.B. Stearns, C.-H. Chang, and D.G. Stearns Journal of Applied Physics 71 1992 187
18. A. Ulyanenkov, R. Matsuo, K. Omote, K. Inaba, J. Harada, M. Ishino, M. Nishii, and O. Yoda Journal of Applied Physics 87 2000 7255
19. E. Schubert, S. Mändl, H. Neumann, and B. Rauschenbach Applied Physics A: Materials Science & Processing 80 2005 47