Tuning etch selectivity of fused silica irradiated by femtosecond laser pulses by controlling polarization of the writing pulses

Journal of Applied Physics

Volumn 109, Issue 5, 2011, Pages

  Yu, Xiaoming ^a,b   Liao, Yang ^a   He, Fei ^a   Zeng, Bin ^a,b   Cheng, Ya ^a   Xu, Zhizhan ^a   Sugioka, Koji ^c   Midorikawa, Katsumi ^c  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c RIKEN   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL ETCH; CIRCULARLY POLARIZED LASERS; ETCH RATES; ETCH SELECTIVITY; EXPERIMENTAL STUDIES; FEMTO-SECOND LASER; FEMTOSECOND LASER PULSE; HIGH PULSE ENERGY; POLARIZATION STATE; PULSE ENERGIES; UNDERLYING MECHANISM;

POLARIZATION; SILICA; ULTRAFAST LASERS; ULTRASHORT PULSES;

FUSED SILICA;

EID: 79953000004     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3555080     Document Type: Article

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