Optical parameters of oxide films typically used in optical coating production

Applied Optics

Volumn 50, Issue 9, 2011, Pages

  Tikhonravov, Alexander V ^a   Trubetskov, Michael K ^a   Amotchkina, Tatiana V ^a   DeBell, Gary ^b   Pervak, Vladimir ^c   Sytchkova, Anna Krasilnikova ^d   Grilli, Maria Luisa ^d   Ristau, Detlev ^e  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b MLD Technologies   (United States)

^c UNIVERSITY OF MUNICH   (Germany)

^d ENEA   (Italy)

^e LASER ZENTRUM HANNOVER E V   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CHARACTERIZATION; DATA HANDLING; DEPOSITION; OPTICAL COATINGS; OPTICAL VARIABLES CONTROL; OXIDE FILMS; REFRACTIVE INDEX; THIN FILMS;

DEPOSITION CONDITIONS; MEASUREMENT DATA; MODELS AND ALGORITHMS; OPTICAL PARAMETER; OXIDE THIN FILMS; THIN FILM MATERIAL; WAVELENGTH DEPENDENCE; WAVELENGTH DEPENDENCY;

OPTICAL FILMS;

EID: 79952805492     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.000C75     Document Type: Article

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