Influence of hydrogen on the properties of Al and Ga-doped ZnO films at room temperature

Applied Optics

Volumn 50, Issue 9, 2011, Pages

  Li, Meng Chi ^a   Kuo, Chien Cheng ^a   Peng, Ssu Hsiang ^a   Chen, Sheng Hui ^a   Lee, Cheng Chung ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTIVE FILMS; GALLIUM; HYDROGEN; THIN FILMS; ZINC OXIDE;

GADOPED ZNO (GZO); HIGH TRANSMITTANCE; LOW RESISTIVITY; PROPERTIES OF AL; PULSED DC MAGNETRON SPUTTERING; SHALLOW DONORS; TRANSPARENT CONDUCTIVE THIN FILMS; VISIBLE REGION;

ALUMINUM;

EID: 79952788708     PISSN: 1559128X     EISSN: 15394522     Source Type: Journal    
DOI: 10.1364/AO.50.00C197     Document Type: Article

References (17)

1. O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schope, C. Beneking, H. Wagner, A. Loffl, and H. W. Schock, "Texture etched ZnO:Al coated glass substrates for silicon based thin film solar cells," Thin Solid Films 351, 247-253 (1999). (Pubitemid 32213766)
2. H. Kim, A. Pique, J. S. Horwitz, H. Murata, Z. H. Kafafb, C. M. Gilmore, and D. B. Chrisey, "Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices," Thin Solid Films 377, 798-802 (2000). (Pubitemid 32035312)
3. U. Betz, M. Kharrazi Olsson, J. Marthy, M. F. Escolá, and F. Atamny, "Thin films engineering of indium tin oxide: Large area flat panel displays application," Surf. Coat. Technol. 200, 5751-5759 (2006).
4. M. Katayama, "TFT-LCD technology," Thin Solid Films 341, 140-147 (1999).
5. L. Raniero, I. Ferreira, A. Pimentel, A. Gonçalves, P. Canhola, E. Fortunato, and R. Martins, "Role of hydrogen plasma on electrical and optical properties of ZGO, ITO and IZO transparent and conductive coatings," Thin Solid Films 511, 295-298 (2006). (Pubitemid 44255781)
6. K. Hashimoto, S. Ogawa, A. Nonoguchi, T. Omori, and M. Yamaguchi, "Preparation of piezoelectric ZnO films by target facing type of sputtering method," in Proceedings of IEEE Ultrasonics Symposium (IEEE, 1998), pp. 207-212.
7. K. B. Sundaram and A. Khan, "Characterization and optimization of zinc oxide films by r.f. magnetron sputtering," Thin Solid Films 295, 87-91 (1997). (Pubitemid 127378027)
8. D. C. Look, J. W. Hemsky, and J. R. Sizelove, "Residual native shallow donor in ZnO," Phys. Rev. Lett. 82, 2552-2555 (1999). (Pubitemid 129305488)
9. H. W. Lee, S. P. Lau, Y. G. Wang, K. Y. Tse, H. H. Hng, and B. K. Tay, "Structural, electrical and optical properties of Al-doped ZnO thin films prepared by filtered cathodic vacuum arc technique," J. Cryst. Growth 268, 596-601 (2004).
10. M. Miyazaki, K. Sato, A. Mitsui, and H. Nishimura, "Properties of Ga-doped ZnO films," J. Non-Cryst. Solids 218, 323-328 (1997). (Pubitemid 127369688)
11. K. Yim and C. Lee, "Dependence of the electrical and optical properties of sputter-deposited ZnO:Ga films on the annealing temperature, time, and atmosphere," J. Mater. Sci. 18, 385-390 (2007). (Pubitemid 46062990)
12. Y. J. Park, H. N. Kim, and H. H. Shin, "Effects of deposition temperature on the crystallinity of Ga-doped ZnO thin films on glass substrates prepared by sputtering method," Appl. Surf. Sci. 255, 7532-7536 (2009).
13. C. G. Van de Walle, "Hydrogen as a cause of doping in zinc oxide," Phys. Rev. Lett. 85, 1012-1015 (2000).
14. T. S. Moss, "The interpretation of the properties of indium antimonide," Proc. Phys. Soc. London Sect. B 67, 775-782 (1954).
15. E. Burstein, "Anomalous optical absorption limit in InSb," Phys. Rev. 93, 632-633 (1954).
16. N. Fujimura, T. Nishihara, S. Goto, J. Xu, and T. Ito, "Control of preferred orientation for ZnOx films: Control of self-texture," J. Cryst. Growth 130, 269-279 (1993).
17. L. Y. Chen, W. H. Chen, J. J. Wang, C. N. Hong, and Y. K. Su, "Hydrogen-doped high conductivity ZnO films deposited by radio-frequency magnetron sputtering," Appl. Phys. Lett. 85, 5628-5630 (2004).