Electrical and optical properties dependence on evolution of roughness and thickness of Ga:ZnO films on rough quartz substrates

Surface and Coatings Technology

Volumn 205, Issue 11, 2011, Pages 3530-3534

  Liu, Yun yan ^a,b   Yang, Shan ying ^b,c   Wei, Gong xiang ^a   Song, Hong sheng ^b   Cheng, Chuan fu ^b   Xue, Chen shan ^b   Yuan, Yu zhen ^a  

^a SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

^b SHANDONG NORMAL UNIVERSITY   (China)

^c Laiwu Vocational and Technical College   (China)

Author keywords

Ga doped ZnO; Resistivity; Roughness evolution; Self affine fractal; Thickness

Indexed keywords

ELECTRIC CONDUCTIVITY; FILM THICKNESS; FRACTALS; GALLIUM; GALLIUM ALLOYS; LAMINATES; OPACITY; OPTICAL PROPERTIES; QUARTZ; SURFACE ROUGHNESS; THICK FILMS; ZINC OXIDE;

ELECTRICAL AND OPTICAL PROPERTIES; FRACTAL CHARACTERISTICS; GA-DOPED ZNO; HEIGHT-HEIGHT CORRELATION FUNCTIONS; LASER DEPOSITIONS; ROUGHNESS EVOLUTION; SELF-AFFINE FRACTALS; THICKNESS;

FILM GROWTH;

EID: 79952747318     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.12.029     Document Type: Article

References (22)

1. C. Lee, K. Lim, J. Song, Sol. Energy Mater. Sol. Cells 43 (1996) 37.
2. R. Street, Technology and Applications of Amorphous Silicon, Springer, New York, 2000.
3. T. Kwon, S. Park, J. Ryu, H. Choi, Sens. Actuators B Chem. 46 (1998) 75.
4. X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, C. Cheng, et al., J. Cryst. Growth 274 (2005) 474.
5. S.W. Shin, K.U. Sim, J.H. Moon, J.H. Kim, Curr. Appl Phys. 10 (2010) S274.
6. E. Nam, Y.H. Kang, D. Jung, Y.S. Kim, Thin Solid Films 518 (2010) 6245.
7. L. Gong, J.G. Lu, Z.Z. Ye, Sol. Energy Mater. Sol. Cells 94 (2010) 937.
8. Y.-P. Zhao, G.-C. Wang, T.-M. Lu, Characterization of Amorphous and Crystalline Rough Surface: Principles and Applications, Academic Press, New York, 2001.
9. H.-N. Yang, Y.-P. Zhao, G.-C. Wang, T.-M. Lu, Phys. Rev. Lett. 76 (1996) 3774.
10. C. Guill'en, J. Herrero, Semicond. Sci. Technol. 23 (2008) 075002.
11. S.S. Lin, J.L. Huang, D.F. Lii, Surf. Coat. Technol. 190 (2005) 372.
12. R.C. Munoz, G. Vidal, G. Kremer, L. Moraga, C. Arenas, A. Concha, J. Phys. Condens. Matter 12 (2000) 2903.
13. Y. Wang, K.-W. Xu, Thin Solid Films 468 (2004) 310.
14. F. Family, Phys. A 168 (1990) 561.
15. H.J. Qi, L.H. Huang, Z.S. Tang, C.F. Cheng, J.D. Shao, Z.X. Fan, Thin Solid Films 444 (2003) 146.
16. W.J. Jeong, S.K. Kim, G.C. Park, Thin Solid Films 506 (2006) 180.
17. Y. Sato, M. Taketomo, N. Ito, A. Miyamura, Y. Shigesato, Thin Solid Films 516 (2008) 4598.
18. V. Korobov, M. Leibovitch, Y. Shapira, Appl. Phys. Lett. 65 (1994) 2290.
19. Y. Han, D. Kim, J.-S. Cho, Y.-W. Beag, S.-K. Koh, V.S. Chernysh, J. Appl. Phys. 97 (2005) 024910.
20. B.S. Chiou, S.T. Hsieh, W.F. Wu, J. Am. Ceram. Soc. 77 (1994) 1740.
21. G. Palasantzas, J. Barnaś, Phys. Rev. B 56 (1997) 7726.
22. G. Palasantzas, Y.-P. Zhao, G.-C. Wang, T.-M. Lu, J. Barnas, J.Th.M. De Hosson,Phys. Rev. B 61 (2000) 11109.