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Volumn 468, Issue 1-2, 2004, Pages 310-315
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Characterization of surface morphology of copper tungsten thin film by surface fractal geometry and resistivity
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Author keywords
Copper tungsten thin films; Fractal dimension; Resistivity; Surface morphology
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Indexed keywords
AMORPHOUS FILMS;
ATOMIC FORCE MICROSCOPY;
ELECTRIC RESISTANCE;
FRACTALS;
MAGNETRON SPUTTERING;
MORPHOLOGY;
SILICON WAFERS;
TUNGSTEN;
X RAY DIFFRACTION ANALYSIS;
COPPER TUNGSTEN THIN FILMS;
FRACTAL DIMENSIONS;
FRACTAL GEOMETRY;
MICRODEVICES;
THIN FILMS;
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EID: 4644296078
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2004.05.132 Document Type: Article |
Times cited : (29)
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References (17)
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