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Volumn 468, Issue 1-2, 2004, Pages 310-315

Characterization of surface morphology of copper tungsten thin film by surface fractal geometry and resistivity

Author keywords

Copper tungsten thin films; Fractal dimension; Resistivity; Surface morphology

Indexed keywords

AMORPHOUS FILMS; ATOMIC FORCE MICROSCOPY; ELECTRIC RESISTANCE; FRACTALS; MAGNETRON SPUTTERING; MORPHOLOGY; SILICON WAFERS; TUNGSTEN; X RAY DIFFRACTION ANALYSIS;

EID: 4644296078     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.05.132     Document Type: Article
Times cited : (29)

References (17)
  • 8
    • 0004255480 scopus 로고
    • New York and London: Plenum Press
    • Russ J. Fractal Surfaces. 1994;77 Plenum Press, New York and London.
    • (1994) Fractal Surfaces , pp. 77
    • Russ, J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.