Electrostatic immobilization of polyoxometallates on silicon: X-ray Photoelectron Spectroscopy and electrochemical studies

Thin Solid Films

Volumn 519, Issue 11, 2011, Pages 3732-3738

  Fleury, Benoit ^a   Billon, Martial ^a   Duclairoir, Florence ^a   Dubois, Lionel ^a   Fanton, Aurélien ^b   Bidan, Gérard ^a  

^a CEA GRENOBLE   (France)

^b CEA LETI   (France)

Author keywords

Electrostatic interactions; Grafting; Polyoxometallates; Silicon; X ray Photoelectron Spectroscopy

Indexed keywords

AMINO GROUP; AMMONIUM GROUPS; AMMONIUM LAYERS; CAPPING LAYER; ELECTROCHEMICAL RESPONSE; ELECTROCHEMICAL STUDIES; ELECTROSTATIC IMMOBILIZATION; ELECTROSTATIC INTERACTIONS; GRAFTING; KEGGIN-TYPE; ORGANIC-INORGANIC COMPOSITE FILMS; POLYALLYLAMINE; POLYOXOMETALLATES; PROTONATED; SILICON SURFACES; SURFACE COVERAGES;

AMMONIUM COMPOUNDS; COMPOSITE FILMS; CYCLIC VOLTAMMETRY; ELECTROCHEMISTRY; ELECTRONS; ELECTROSTATICS; GRAFTING (CHEMICAL); PHOTOELECTRICITY; PHOTONS; TUNGSTEN; X RAYS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 79952735879     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.341     Document Type: Article

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