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Materials Chemistry and Physics

Volumn 114, Issue 2-3, 2009, Pages 1000-1003

Silica-supported silicotungstic acid: A study by X-ray photoelectron spectroscopy

(4) Berry, Frank J a Derrick, Glyn R a Marco, José F b Mortimer, Michael a

a OPEN UNIVERSITY (United Kingdom)

b INSTITUTO DE QUÍMICA FÍSICA ROCASOLANO (Spain)

Author keywords

Chemisorption; Surfaces; X ray photoemission spectroscopy (XPS)

Indexed keywords

ACIDS; ADSORPTION; ATOMIC SPECTROSCOPY; ATOMS; BINDING ENERGY; CHEMISORPTION; EMISSION SPECTROSCOPY; LUMINESCENCE OF ORGANIC SOLIDS; NEGATIVE IONS; ORBITS; OXIDES; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTOEMISSION; PHOTOIONIZATION; PHOTONS; SILICA; SPIN DYNAMICS; TUNGSTEN;

ACTIVE SITES; DOUBLE BONDS; LOW LOADINGS; RELATIVE CONTRIBUTIONS; SILANOL GROUPS; SILICA SURFACES; SILICOTUNGSTIC ACIDS; SPIN ORBITS; STRONG INTERACTIONS; SURFACES; TUNGSTEN ATOMS; X-RAY PHOTOELECTRON SPECTROSCOPIES; X-RAY PHOTOELECTRON SPECTRUM; X-RAY PHOTOEMISSION SPECTROSCOPY (XPS);

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 58849133276 PISSN: 02540584 EISSN: None Source Type: Journal
DOI: 10.1016/j.matchemphys.2008.11.003 Document Type: Article

Times cited : (37)

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