Polyoxometallate containing polymeric materials for nanolithography and molecular devices

Materials Research Society Symposium - Proceedings

Volumn 705, Issue , 2002, Pages 49-59

  Glezos, N ^a   Argitis, P ^a   Velessiotis, D ^a   Koutsolelos, P ^a   Diakoumakos, C D ^a   Tserepi, A ^a   Beltsios, K ^a  

^a INSTITUTE OF NANOSCIENCE AND NANOTECHNOLOGY   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

LIFT-OFF PROCESS; MOLECULAR DEVICE; MOLECULAR ELECTRONIC NANODEVICE; POLYOXOMETALLATE COMPOUND;

COMPOSITE MATERIALS; ELECTRON BEAM LITHOGRAPHY; ELECTRON DEVICES; ELECTRON ENERGY LEVELS; ELECTRON TRANSPORT PROPERTIES; MOLECULAR STRUCTURE; MOLYBDENUM COMPOUNDS; NANOTECHNOLOGY; PHOTONS; THERMAL EFFECTS; TUNGSTEN COMPOUNDS;

ORGANIC POLYMERS;

EID: 0036351773     PISSN: 02729172     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (27)

1. Architectures for molecular electronic computers
2. Heteropoly and isopoly oxometallates