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Volumn 8, Issue 3, 2011, Pages 759-762

Enhanced iron gettering by short, optimized low-temperature annealing after phosphorus emitter diffusion for industrial silicon solar cell processing

Author keywords

Defect engineering; P gettering; Silicon solar cells; Simulation

Indexed keywords

ANNEALING TEMPERATURES; DEFECT ENGINEERING; ELECTRON LIFETIME; EMITTER DIFFUSION; GETTERING; GETTERING TREATMENTS; INDUSTRIAL FABRICATION; IRON GETTERING; LOW TEMPERATURE ANNEALING; LOW TEMPERATURES; P-DIFFUSION; PROCESSING TIME; SI WAFER; SIMULATION; SOLAR CELL EFFICIENCIES; SOLAR CELL PERFORMANCE; SOLAR CELL PROCESSING;

EID: 79952683053     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.201000334     Document Type: Article
Times cited : (10)

References (12)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.