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Volumn 8, Issue 3, 2011, Pages 759-762
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Enhanced iron gettering by short, optimized low-temperature annealing after phosphorus emitter diffusion for industrial silicon solar cell processing
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Author keywords
Defect engineering; P gettering; Silicon solar cells; Simulation
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Indexed keywords
ANNEALING TEMPERATURES;
DEFECT ENGINEERING;
ELECTRON LIFETIME;
EMITTER DIFFUSION;
GETTERING;
GETTERING TREATMENTS;
INDUSTRIAL FABRICATION;
IRON GETTERING;
LOW TEMPERATURE ANNEALING;
LOW TEMPERATURES;
P-DIFFUSION;
PROCESSING TIME;
SI WAFER;
SIMULATION;
SOLAR CELL EFFICIENCIES;
SOLAR CELL PERFORMANCE;
SOLAR CELL PROCESSING;
ANNEALING;
DIFFUSION;
PHOSPHORUS;
SILICON SOLAR CELLS;
SILICON WAFERS;
SOLAR CELLS;
SEMICONDUCTING SILICON COMPOUNDS;
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EID: 79952683053
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.201000334 Document Type: Article |
Times cited : (10)
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References (12)
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