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Applied Surface Science

Volumn 257, Issue 13, 2011, Pages 5908-5912

Characterization of DC reactive magnetron sputtered NiO films using spectroscopic ellipsometry

(7) Peng, T C a Xiao, X H a,b Han, X Y c Zhou, X D a Wu, W a Ren, F a Jiang, C Z a

a WUHAN UNIVERSITY (China)

b UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA (China)

c HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

Author keywords

NiO films; Spectroscopic ellipsometry; Tauc Lorentz dispersion function

Indexed keywords

ARGON; MAGNETRON SPUTTERING; OXYGEN; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; X RAY DIFFRACTION;

DC REACTIVE MAGNETRON SPUTTERING; EXTINCTION COEFFICIENTS; GRAZING INCIDENCE X-RAY DIFFRACTION; LORENTZ DISPERSION; NIO FILMS; PARTIAL PRESSURE OF OXYGEN; SPECTRAL REGION; SPUTTERING PROCESS;

NICKEL OXIDE;

EID: 79952533389 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.01.138 Document Type: Article

Times cited : (31)

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