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Volumn 503, Issue 1-2, 2006, Pages 40-44

The oxidation kinetics of nickel thin films studied by spectroscopic ellipsometry

Author keywords

Ellipsometry; Nickel oxide; Oxidation

Indexed keywords

ELLIPSOMETRY; GLASS; MAGNETRON SPUTTERING; NICKEL COMPOUNDS; OXIDATION; RAPID THERMAL ANNEALING; X RAY DIFFRACTION ANALYSIS;

EID: 33644775604     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.11.031     Document Type: Article
Times cited : (33)

References (24)
  • 17
    • 33644786974 scopus 로고    scopus 로고
    • FilmWizard Software, Scientific Computing International, Inc. 1999
    • FilmWizard Software, Scientific Computing International, Inc. 1999.
  • 18
    • 33644750280 scopus 로고    scopus 로고
    • U. S. Patent No. 5889592, 30 Mar.
    • E. Zawaideh, U. S. Patent No. 5889592, 30 Mar. 1999.
    • (1999)
    • Zawaideh, E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.