Ozone-enhanced molecular beam deposition of nickel oxide (NiO) for sensor applications

Thin Solid Films

Volumn 310, Issue 1-2, 1997, Pages 19-23

  Neubecker, Alexandra ^a   Pompl, Thomas ^a   Doll, Theodor ^a   Hansch, Walter ^a   Eisele, Ignaz ^a  

^a BUNDESWEHR UNIVERSITY MUNICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; AUGER ELECTRON SPECTROSCOPY; ELLIPSOMETRY; MOLECULAR BEAMS; NICKEL COMPOUNDS; OPTICAL PROPERTIES; OZONE; STOICHIOMETRY; SUBSTRATES; THIN FILMS; VACUUM APPLICATIONS; VAPOR DEPOSITION;

GAS MIXTURE STREAM; MOLECULAR BEAM DEPOSITION;

SEMICONDUCTING FILMS;

EID: 0031271733     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)00329-5     Document Type: Article

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