Formation of ordered arrays of gold particles on silicon and silicon-dioxide by nanoindentation patterning

Materials Research Society Symposium Proceedings

Volumn 1228, Issue , 2010, Pages 36-41

  Ruffell, S ^a   Venkatachalam, D K ^a   Shalav, A ^a   Elliman, R G ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING CONDITION; AU PARTICLES; DEGREE OF PRECISION; GOLD PARTICLES; GOLD-COATED; INITIAL THICKNESS; NANOINDENTERS; ORDERED ARRAY; PLASMA-ENHANCED CHEMICAL VAPOUR DEPOSITIONS; PRE-PATTERNING; RESIDUAL INDENT; RIPENING PROCESS; SI(100) SURFACE; SILICON DIOXIDE; SURFACE PARTICLES; THERMAL-ANNEALING;

ANNEALING; GOLD; GOLD DEPOSITS; NANOINDENTATION; OSTWALD RIPENING; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS; SILICON OXIDES;

GOLD COATINGS;

EID: 77957762126     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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