Nano-patterning with Block Copolymers

Superlattices and Microstructures

Volumn 44, Issue 4-5, 2008, Pages 693-698

  La Fata, Pietro ^a,b   Puglisi, Rosaria ^a   Lombardo, Salvatore ^a   Bongiorno, Corrado ^a  

^a CNR   (Italy)

^b UNIVERSITY OF CATANIA   (Italy)

Author keywords

ICP; Lithography; Patterning; Polymers

Indexed keywords

ABS RESINS; BLOCK COPOLYMERS; COPOLYMERIZATION; COPOLYMERS; PLASTIC PRODUCTS; POROUS MATERIALS; RANDOM ACCESS STORAGE; SILICON COMPOUNDS; STYRENE;

BLOCK COPOLYMER TEMPLATES; DIFFERENT SUBSTRATES; ETCHING MASKS; HEXAGONAL CONFIGURATION; ICP; LENGTH SCALING; LITHOGRAPHY; LONG RANGE ORDERS; METHYL METHACRYLATES; NANO-PATTERNING; NANO-POROUS; OPTIMAL CONDITIONS; PATTERNED MATERIALS; PATTERNING; PHASE CHANGES; RANDOM ACCESS MEMORIES; SELF-ASSEMBLED TEMPLATE; SELF-ASSEMBLING; SYNTHESIS PARAMETERS;

POLYMERS;

EID: 53749087020     PISSN: 07496036     EISSN: 10963677     Source Type: Journal    
DOI: 10.1016/j.spmi.2007.12.017     Document Type: Article

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