Deposition of ZnO film using an open-air cold plasma generator

Thin Solid Films

Volumn 506-507, Issue , 2006, Pages 155-158

  Suzaki, Yoshifumi ^a   Ejima, Seiki ^a   Shikama, Tomokazu ^b   Azuma, Shunryo ^c   Tanaka, Osamu ^c   Kajitani, Takahiro ^c   Koinuma, Hideomi ^d  

^a KAGAWA UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF TECHNOLOGY   (Japan)

^c Okura Industrial Co Ltd   (Japan)

^d TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Atmospheric pressure cold plasma; Helium gas; Plasma deposition; Zinc oxide

Indexed keywords

ATMOSPHERIC PRESSURE; CATHODE FOLLOWERS; ELECTRIC POTENTIAL; GLASS; HELIUM NEON LASERS; PLASMAS; POLYSILICON; STABILITY; SUBSTRATES; ZINC OXIDE;

ATMOSPHERIC PRESSURE COLD PLASMA; EQUILIBRIUM; HELIUM GAS;

THIN FILMS;

EID: 33645215839     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.166     Document Type: Conference Paper

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