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Thin Solid Films

Volumn 518, Issue 13, 2010, Pages 3513-3516

Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure

(3) Ito, Yosuke a Sakai, Osamu a Tachibana, Kunihide a

a KYOTO UNIVERSITY (Japan)

Author keywords

Chemical vapor deposition; Fourier transform infrared spectroscopy (FTIR); Plasma processing and deposition; Zinc oxide

Indexed keywords

CARBON FRACTION; CARBON RESIDUE; GASEOUS PHASE; HIGH QUALITY; INFRARED SPECTRUM; NONTHERMAL PLASMA; PLASMA PROCESSING AND DEPOSITION; SUBSTRATE TEMPERATURE; ZNO FILMS;

ATMOSPHERIC PRESSURE; CARBON FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; METALLIC FILMS; PLASMA ACCELERATORS; PLASMA JETS; PLASMA TORCHES; PLASMAS; SPECTROSCOPY; ZINC; ZINC OXIDE;

PLASMA DEPOSITION;

EID: 77949482918 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.11.034 Document Type: Article

Times cited : (36)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.