In situ probing of interfacial processes in the electrodeposition of copper by confocal Raman microspectroscopy

Journal of Electroanalytical Chemistry

Volumn 446, Issue 1-2, 1998, Pages 189-203

  Texier, F ^a   Servant, L ^b   Bruneel, J L ^b   Argoul, F ^a  

^a CENTRE DE RECHERCHE PAUL PASCAL   (France)

^b UNIVERSITÉ DE BORDEAUX   (France)

Author keywords

Confocal raman microspectroscopy; Interfacial processes; Pulsed current copper electrodeposition

Indexed keywords

ADSORPTION; COPPER OXIDES; ELECTROCHEMICAL ELECTRODES; ELECTRODEPOSITION; PH EFFECTS; RAMAN SPECTROSCOPY; REDUCTION; SULFUR COMPOUNDS;

CONFOCAL RAMAN MICROSPECTROSCOPY; INTERFACIAL PROCESS;

COPPER;

EID: 0032046507     PISSN: 15726657     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-0728(97)00575-5     Document Type: Article

References (37)

1. A. Tadjeddine, D. Guay, M. Ladouceur, G. Tourillon, Phys. Rev. Lett. 66 (1991) 2235.
2. R. McCreery, Prog. Anal. Spectrosc. 11 (1988) 141.
3. R. Gale, Spectroelectrochemistry: Theory and Practice, Plenum Press, New York, 1988.
4. G. Rosasco, E. Roedder, J. Simmons, Science 175 (1975) 5557.
5. D. Jeanmaire, R.V. Duyne, J. Electroanal. Chem. 84 (1977) 1.
6. R. McCreery, R. Packard, Anal. Chem. 61 (1989) 775A.
7. D. Schwartz, R. Muller, Surface Science 248 (1991) 349.
8. M. Matsushita, M. Sano, Y. Hayakawa, H. Honjo, Y. Sawada, Phys. Rev. Lett. 53 (1984) 286.
9. D. Grier, E.B. Jacob, R. Clarke, L. Sander, Phys. Rev. Lett. 56 (1986) 1264.
10. Y. Sawada, A. Dougherty, J. Gollub, Phys. Rev. Lett. 56 (1986) 1260.
11. W. Guttinger, G. Dangelmayr (Eds.) The Physics of Structure Formation, Springer Verlag, Berlin, 1987.
12. A. Kuhn, F. Argoul, J. Muzy, A. Arneodo, Phys. Rev. Lett. 73 (1994) 2998.
13. A. Arneodo, F. Argoul, A. Kuhn, J. Muzy, M. Tabard, J. Diff. Equat. Appl. 1 (1995) 117.
14. A. Kuhn, F. Argoul, J. Electroanal. Chem 397 (1995) 93.
15. T. Witten, L. Sander, Phys. Rev. Lett. 47 (1981) 1400.
16. T. Witten, L. Sander, Phys. Rev. B 27 (1987) 5686.
17. A. Kuhn, F. Argoul, Fractals 1 (1994) 451.
18. M. Lopez-Salvans, F. Sagues, J. Claret, J. Bassas, J. Electroanal. Chem. 421 (1997) 205.
19. P. Trigueros, F. Sagues, J. Claret, Phys. Rev. E 49 (1994) 4328.
20. M.-Q. Lopez-Salvans, P. Trigueros, S. Vallmitjana, J. Claret, F. Sagues, Phys. Rev. Lett. 76 (1996) 4062.
21. C. Pyun, S. Park, J. Electrochem. Soc. 133 (1986) 2024.
22. J. Hamilton, J. Farmer, R. Anderson, J. Electrochem. Soc. 133 (1986) 739.
23. R. Russo, F. McLarnon, J. Spear, E. Cairns, J. Electrochem. Soc. 134 (1987) 2783.
24. S. Hartinger, B. Pettinger, K. Doblhofer, J. Electroanal. Chem. 397 (1995) 335.
25. D. Otero, G. Marshall, S. Tagtachian, Fractals 4 (1996) 7.
26. D. Lu, K. Tanaka, J. Electrochem. Soc. 143 (1996) 2105.
27. M. Pourbaix, Atlas d'équilibres électrochimiques, Gauthier-Villars, Paris, 1963.
28. E. Mattson, J.O. Bockris, Trans. Faraday Society 55 (1959) 1586.
29. S. Sharonov, I. Nabiev, I. Chourpa, A. Feofanov, P. Valisa, M. Manfait, J. Raman Spectrosc. 25 (1994) 699.
30. H. Kanno, Chem. Phys. Lett. 170 (1990) 382.
31. S. Ikawa, M. Yamada, M. Kimura, J. Raman Spectrosc. 6 (1977) 89.
32. R. Tabaksblat, R. Meier, B. Kip, Appl. Spectrosc. 46 (1992) 60.
33. M. Moskovits, Rev. Modern Phys. [and references therein] 57 (1985) 783.
34. F. Argoul, E. Freysz, A. Kuhn, C. Léger, L. Potin, Phys. Rev. E 53 (1996) 1777.
35. F. Texier, C. Léger, F. Argoul (unpublished data).
36. N. Ibl, in: P. Delahay, C. Tobias (Eds.), Advances in Electrochemistry and Electrochemical Engineering, vol. 2, Wiley, New York, 1962, pp. 49-143.
37. D. Irish, H. Chen, J. Phys. Chem. 74 (1970) 3796.