Substrate temperature influence on boron carbide coatings grown by the PLD technique

Surface and Coatings Technology

Volumn 205, Issue 12, 2011, Pages 3607-3612

  Castillo, H A ^a,b   Restrepo Parra, E ^a   Velez J M ^b   de la Cruz, W ^c  

^a UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^b UNIVERSIDAD NACIONAL DE COLOMBIA   (Colombia)

^c UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

Electron diffraction; H BC; PLD; Substrate temperature; TEM; XPS

Indexed keywords

H-BC; PLD; SUBSTRATE TEMPERATURE; TEM; XPS;

ABLATION; AMORPHOUS FILMS; AUGER ELECTRON SPECTROSCOPY; BORON; COATINGS; ELECTRON DIFFRACTION; ELECTRONS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

BORON CARBIDE;

EID: 79951724829     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.12.043     Document Type: Article

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