Influence of carbon content on the crystallographic structure of boron carbide films

Surface and Coatings Technology

Volumn 125, Issue 1-3, 2000, Pages 141-146

  Conde, O ^a   Silvestre, A J ^b   Oliveira, J C ^a  

^a UNIVERSITY OF LISBON   (Portugal)

^b Instituto Superior de Transportes   (Portugal)

Author keywords

Boron carbide; Crystallographic structure; Laser CVD; Micro Raman spectroscopy

Indexed keywords

BORON CARBIDE; CARBON DIOXIDE LASERS; CERAMIC COATINGS; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; LASER BEAM EFFECTS; LATTICE CONSTANTS; MICROANALYSIS; RAMAN SPECTROSCOPY; THIN FILMS; X RAY CRYSTALLOGRAPHY;

GLANCING-INCIDENCE X RAY DIFFRACTION (GIXRD); LASER-ASSISTED CHEMICAL VAPOR DEPOSITION (LCVD);

PROTECTIVE COATINGS;

EID: 0033881602     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00594-0     Document Type: Article

References (12)

1. Ridgway R.R. Trans. Am. Electrochem. Soc. 66:1934;117.
2. Telle R. Swain M.V. Structure and Properties of Ceramics. Materials Science and Technology. vol. 11:1994;173-266 VCH Publishers, Weinheim.
3. Olsson M., Soderberg S., Stridh B., Jansson U., Carlsson J.-O. Thin Solid Films. 172:1989;95.
4. Jiménez I., Sutherland D.G.J., van Buuren T., Carlisle J.A., Terminello L.J., Himpsel F.J. Phys. Rev. B. 57:1998;13167.
5. Emin D. Phys. Rev. B. 38:1988;6041.
6. Tallant D.R., Aselage T.L., Campbell A.N., Emin D. Phys. Rev. B. 40:1989;5649.
7. Aselage T.L., Tallant D.R., Gieske J.H. Freer R. The Physics and Chemistry of Carbides, Nitrides and Borides. 1990;97-111 Kluwer Academic Publishers, Dordrecht.
8. Oliveira J.C., Oliveira M.N., Conde O. Surf. Coat. Technol. 80:1996;100.
9. Oliveira J.C., Conde O. Thin Solid Films. 307:1997;29.
10. Paramês M.L.F., Conde O. J. Physique IV, Coll. C. 3:1993;217.
11. Warren B.E. X-ray Diffraction. 1990;Dover Publications, New York.
12. Yakel H.L. Acta Crystallogr. B. 31:1975;1791.