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Volumn 35, Issue 5, 2009, Pages 1877-1882

Microstructure and deposition mechanism of CVD amorphous boron carbide coatings deposited on SiC substrates at low temperature

Author keywords

Boron carbide coating; CVD; Deposition mechanism; Microstructure

Indexed keywords

AMORPHOUS BORONS; BORON CARBIDE COATING; BORON CONTENTS; CVD; DEPOSITED COATINGS; DEPOSITION MECHANISM; DEPOSITION TEMPERATURES; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; FREE CARBONS; INTERNAL STRUCTURES; LOW TEMPERATURES; MICRO-RAMAN SPECTROSCOPIES; REDUCED PRESSURES; SEM; SIC SUBSTRATES; X-RAY DIFFRACTIONS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

EID: 67349234203     PISSN: 02728842     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ceramint.2008.10.020     Document Type: Article
Times cited : (20)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.