Growth, modulation and photoresponse characteristics of vertically aligned ZnO nanowires

Applied Surface Science

Volumn 257, Issue 11, 2011, Pages 4973-4977

  Kar, J P ^a,b   Das, S N ^a   Choi, J H ^a   Lee, T I ^a   Seo, J ^a   Lee, T ^a   Myoung, J M ^a  

^a Yonsei University   (South Korea)

^b UNIVERSITY OF ROME TOR VERGATA   (Italy)

Author keywords

Etching; Metal organic chemical vapor deposition; Microcavity; Photoresponse; Thin film; ZnO nanowires

Indexed keywords

ALUMINUM COATINGS; ALUMINUM NITRIDE; ASPECT RATIO; BARIUM COMPOUNDS; ETCHING; II-VI SEMICONDUCTORS; III-V SEMICONDUCTORS; INDUSTRIAL CHEMICALS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROCAVITIES; NANOWIRES; NITROGEN COMPOUNDS; ORGANIC CHEMICALS; ORGANOMETALLICS; SILICON; THIN FILMS; ZINC OXIDE;

A3. METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD); ALUMINUM NITRIDE (ALN); INTERMEDIATE LAYERS; METAL ORGANIC; PHOTORESPONSE CHARACTERISTICS; PHOTORESPONSES; VERTICALLY ALIGNED; ZNO NANOWIRES;

FLUORINE COMPOUNDS;

EID: 79951678615     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.12.158     Document Type: Article

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