SCOPUS 정보 검색 플랫폼

Volumn 4, Issue 2, 2011, Pages

Strain distribution analysis of sputter-formed strained Si by tip-enhanced Raman spectroscopy

(8) Hanafusa, Hiroaki a Hirose, Nobumitsu b Kasamatsu, Akifumi b Mimura, Takashi b Matsui, Toshiaki b Chong, Harold M H c Mizuta, Hiroshi c Suda, Yoshiyuki a

a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY (Japan)

b NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY (Japan)

c UNIVERSITY OF SOUTHAMPTON (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITIONAL FLUCTUATIONS; NANO-METER-SCALE; STRAIN DISTRIBUTIONS; STRAIN FLUCTUATIONS; STRAINED SURFACES; STRAINED-SI; SURFACE UNDULATION; TIP-ENHANCED RAMAN SPECTROSCOPY;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; EPITAXIAL GROWTH; GERMANIUM; MOLECULAR BEAM EPITAXY; MOLECULAR BEAMS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SILICON; STRAIN;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 79951635387 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.4.025701 Document Type: Article

Times cited : (21)

References (17)

1
- 0032202255
- C. K. Maiti, L. K. Bera, and S. Chattopadhyay: Semicond. Sci. Technol. 13 (1998) 1225.
- (1998) Semicond. Sci. Technol. , vol.13 , pp. 1225
- Maiti, C.K.¹ Bera, L.K.² Chattopadhyay, S.³

2
- 19944433396
- M. L. Lee, E. A. Fitzgerald, M. T. Bulsara, M. T. Currie, and A. Lochtefeld: J. Appl. Phys. 97 (2005) 011101.
- (2005) J. Appl. Phys. , vol.97 , pp. 011101
- Lee, M.L.¹ Fitzgerald, E.A.² Bulsara, M.T.³ Currie, M.T.⁴ Lochtefeld, A.⁵

3
- 79951663398
- K. Sawano, Y. Hoshi, A. Yamada, Y. Hiraoka, N. Usami, K. Arimoto, K. Nakagawa, and Y. Shiraki: Appl. Phys. Express 1 (2008) 121401.
- (2008) Appl. Phys. Express , vol.1 , pp. 121401
- Sawano, K.¹ Hoshi, Y.² Yamada, A.³ Hiraoka, Y.⁴ Usami, N.⁵ Arimoto, K.⁶ Nakagawa, K.⁷ Shiraki, Y.⁸

4
- 67650743714
- N. Hirashita, Y. Moriyama, S. Nakaharai, T. Irisawa, N. Sugiyama, and S. Takagi: Appl. Phys. Express 1 (2008) 101401.
- (2008) Appl. Phys. Express , vol.1 , pp. 101401
- Hirashita, N.¹ Moriyama, Y.² Nakaharai, S.³ Irisawa, T.⁴ Sugiyama, N.⁵ Takagi, S.⁶

5
- 57049084079
- K. Sawano, Y. Kunishi, Y. Satoh, K. Toyama, K. Arimoto, T. Okamoto, N. Usami, K. Nakagawa, and Y. Shiraki: Appl. Phys. Express 1 (2008) 011401.
- (2008) Appl. Phys. Express , vol.1 , pp. 011401
- Sawano, K.¹ Kunishi, Y.² Satoh, Y.³ Toyama, K.⁴ Arimoto, K.⁵ Okamoto, T.⁶ Usami, N.⁷ Nakagawa, K.⁸ Shiraki, Y.⁹

6
- 36449001750
- M. A. Lutz, R. M. Feenstra, F. K. LeGoues, P. M. Mooney, and J. O. Chu: Appl. Phys. Lett. 66 (1995) 724.
- (1995) Appl. Phys. Lett. , vol.66 , pp. 724
- Lutz, M.A.¹ Feenstra, R.M.² Legoues, F.K.³ Mooney, P.M.⁴ Chu, J.O.⁵

7
- 13244272298
- K. Sawano, N. Usami, K. Arimoto, S. Koh, K. Nakagawa, and Y. Shiraki: Mater. Sci. Semicond. Proc. 8 (2005) 177.
- (2005) Mater. Sci. Semicond. Proc. , vol.8 , pp. 177
- Sawano, K.¹ Usami, N.² Arimoto, K.³ Koh, S.⁴ Nakagawa, K.⁵ Shiraki, Y.⁶

8
- 33947304776
- H. Maekawa, Y. Sano, C. Ueno, and Y. Suda: J. Cryst. Growth 301-302 (2007) 1017.
- (2007) J. Cryst. Growth , vol.301-302 , pp. 1017
- Maekawa, H.¹ Sano, Y.² Ueno, C.³ Suda, Y.⁴

9
- 54249117746
- H. Hanafusa, A. Kasamatsu, N. Hirose, T. Mimura, T. Matsui, and Y. Suda: Jpn. J. Appl. Phys. 47 (2008) 3020.
- (2008) Jpn. J. Appl. Phys. , vol.47 , pp. 3020
- Hanafusa, H.¹ Kasamatsu, A.² Hirose, N.³ Mimura, T.⁴ Matsui, T.⁵ Suda, Y.⁶

10
- 34249886295
- L. Zhu, C. Georgi, M. Hecker, J. Rinderknecht, A. Mai, Y. Ritz, and E. Zschech: J. Appl. Phys. 101 (2007) 104305.
- (2007) J. Appl. Phys. , vol.101 , pp. 104305
- Zhu, L.¹ Georgi, C.² Hecker, M.³ Rinderknecht, J.⁴ Mai, A.⁵ Ritz, Y.⁶ Zschech, E.⁷

11
- 33645680220
- Y. Saito, M. Motohashi, and N. Hayazawa: Appl. Phys. Lett. 88 (2006) 143109.
- (2006) Appl. Phys. Lett. , vol.88 , pp. 143109
- Saito, Y.¹ Motohashi, M.² Hayazawa, N.³

12
- 0032301527
- C. Rosenbrad, T. Graf, A. Dommann, and H. V. Kanel: Mater. Res. Soc. Symp. Proc. 533 (1998) 301.
- (1998) Mater. Res. Soc. Symp. Proc. , vol.533 , pp. 301
- Rosenbrad, C.¹ Graf, T.² Dommann, A.³ Kanel, H.V.⁴

13
- 0001004651
- P.-H. Wu and D.-S. Lin: Phys. Rev. B 57 (1998) 12421.
- (1998) Phys. Rev. B , vol.57 , pp. 12421
- Wu, P.-H.¹ Lin, D.-S.²

14
- 22844432802
- J. C. Tsang, P. M. Mooney, F. Dacol, and J. O. Chu: J. Appl. Phys. 75 (1994) 8098.
- (1994) J. Appl. Phys. , vol.75 , pp. 8098
- Tsang, J.C.¹ Mooney, P.M.² Dacol, F.³ Chu, J.O.⁴

15
- 0000751559
- M. I. Alonso and K. Winer: Phys. Rev. B 39 (1989) 10056.
- (1989) Phys. Rev. B , vol.39 , pp. 10056
- Alonso, M.I.¹ Winer, K.²

16
- 31544475666
- L. H. Wong, C. C. Wong, J. P. Liu, D. K. Sohn, L. Chan, L. C. Hsia, H. Zang, Z. H. Ni, and Z. X. Shen: Jpn. J. Appl. Phys. 44 (2005) 7922.
- (2005) Jpn. J. Appl. Phys. , vol.44 , pp. 7922
- Wong, L.H.¹ Wong, C.C.² Liu, J.P.³ Sohn, D.K.⁴ Chan, L.⁵ Hsia, L.C.⁶ Zang, H.⁷ Ni, Z.H.⁸ Shen, Z.X.⁹

17
- 4544224620
- K. Kutsukake, N. Usami, T. Ujihara, K. Fujiwara, G. Sazaki, and K. Nakajima: Appl. Phys. Lett. 85 (2004) 1335.
- (2004) Appl. Phys. Lett. , vol.85 , pp. 1335
- Kutsukake, K.¹ Usami, N.² Ujihara, T.³ Fujiwara, K.⁴ Sazaki, G.⁵ Nakajima, K.⁶

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