Low-energy plasma enhanced chemical vapor deposition

Materials Research Society Symposium - Proceedings

Volumn 533, Issue , 1998, Pages 301-306

  Rosenblad, Carsten ^a   Graf, Thomas ^a   Dommann, Alex ^a   Von Kanell, Hans ^a  

^a ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

HETEROJUNCTIONS; MORPHOLOGY; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SURFACE PROPERTIES;

CROSS-HATCHED SURFACE MORPHOLOGY; SURFACE KINETICS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 0032301527     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-533-301     Document Type: Conference Paper

References (10)