Highly reliable oxide-semiconductor TFT for AMOLED displays

Journal of the Society for Information Display

Volumn 19, Issue 2, 2011, Pages 205-211

  Arai, Toshiaki ^a   Morosawa, Narihiro ^a   Tokunaga, Kazuhiko ^a   Terai, Yasuhiro ^a   Fukumoto, Eri ^a   Fujimori, Takashige ^a   Sasaoka, Tatsuya ^a  

^a SONY CORPORATION   (Japan)

Author keywords

Al2O3; Contact material; Dc sputter; OLED; Oxide semiconductor TFT; Passivation; Reliability; Stability; Stress; TFT structure

Indexed keywords

AL2O3; CONTACT MATERIAL; DC SPUTTER; OLED; TFT STRUCTURE;

ALUMINUM; ELECTRIC CONTACTS; LIQUID CRYSTAL DISPLAYS; MOLYBDENUM; MOLYBDENUM OXIDE; PASSIVATION; RELIABILITY; THERMODYNAMIC STABILITY;

THIN FILM TRANSISTORS;

EID: 79951535653     PISSN: 10710922     EISSN: None     Source Type: Journal    
DOI: 10.1889/JSID19.2.205     Document Type: Conference Paper

References (13)

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