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Volumn 509, Issue 10, 2011, Pages 4146-4149
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Low temperature processed highly conducting, transparent, and wide bandgap Gd doped CdO thin films for transparent electronics
a
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Author keywords
Bandgap; Cadmium oxide; Gadolinium; Pulsed laser deposition; Thin film
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Indexed keywords
BAND GAPS;
CADMIUM OXIDE;
CDO FILMS;
CDO THIN FILMS;
EFFECT OF OXYGEN;
ELECTRICAL PROPERTY;
ELECTRICAL RESISTIVITY;
LOW TEMPERATURES;
OPTOELECTRONIC APPLICATIONS;
OXYGEN PARTIAL PRESSURE;
POLYCRYSTALLINE;
PREFERRED ORIENTATIONS;
PULSED-LASER DEPOSITION TECHNIQUE;
ROOT MEAN SQUARE ROUGHNESS;
TRANSPARENT ELECTRONICS;
WIDE BAND GAP;
X-RAY DIFFRACTION STUDIES;
ATOMIC FORCE MICROSCOPY;
CADMIUM;
CADMIUM COMPOUNDS;
CONDUCTIVE FILMS;
DEPOSITION;
DOPING (ADDITIVES);
ELECTRIC CONDUCTIVITY;
ENERGY GAP;
GADOLINIUM;
OPTICAL BAND GAPS;
OXIDE FILMS;
OXYGEN;
PARTIAL PRESSURE;
POSITIVE IONS;
PULSED LASER DEPOSITION;
PULSED LASERS;
SEMICONDUCTING FILMS;
THIN FILMS;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
OPTICAL FILMS;
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EID: 79851514778
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2011.01.007 Document Type: Article |
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Times cited : (46)
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References (24)
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