Bandgap widening in highly conducting CdO thin film by Ti incorporation through radio frequency magnetron sputtering technique

Solid State Communications

Volumn 145, Issue 1-2, 2008, Pages 33-37

  Saha, B ^a   Thapa, R ^a   Chattopadhyay, K K ^a  

^a JADAVPUR UNIVERSITY   (India)

Author keywords

B. RF sputtering; D. Electronic transport; D. Optical properties

Indexed keywords

ATOMIC FORCE MICROSCOPY; CADMIUM COMPOUNDS; DEPOSITION; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; FORCE MEASUREMENT; MAGNETRON SPUTTERING; TITANIUM; ULTRAVIOLET SPECTROPHOTOMETERS;

BANDGAP WIDENING; SILICON SUBSTRATES; SUBSTRATE TEMPERATURE; X-RAY PHOTOELECTRON SPECTROPHOTOMETERS;

THIN FILMS;

EID: 36248957082     PISSN: 00381098     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ssc.2007.10.001     Document Type: Article

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