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Volumn 9, Issue 3, 2009, Pages 673-677

Preparation and characterization of highly conducting and transparent Al doped CdO thin films by pulsed laser deposition

(5) Gupta, R K a Ghosh, K a Patel, R a Mishra, S R b Kahol, P K a

a MISSOURI STATE UNIVERSITY (United States)

b University of Memphis (United States)

Author keywords

Aluminum oxide; Cadmium oxide; Hall effect; Mobility; Pulsed laser deposition; Transparent electrode

Indexed keywords

ALUMINA; ALUMINUM; CADMIUM; CADMIUM COMPOUNDS; CONDUCTIVE FILMS; ELECTRIC RESISTANCE; FILM GROWTH; FILM PREPARATION; GALVANOMAGNETIC EFFECTS; GROWTH (MATERIALS); GROWTH TEMPERATURE; GYRATORS; HALL EFFECT; HALL MOBILITY; LASERS; LIGHT METALS; OPTICAL PROPERTIES; OXIDES; PULSED LASER APPLICATIONS; PULSED LASER DEPOSITION; THIN FILMS;

ALUMINUM OXIDE; BAND GAPS; CADMIUM OXIDE; CDO THIN FILMS; ELECTRICAL RESISTIVITIES; FILM ORIENTATIONS; HIGH TRANSPARENCIES; HIGHLY CONDUCTING; LOW RESISTIVITIES; MOBILITY; PULSED LASER DEPOSITION TECHNIQUES; TRANSPARENT ELECTRODE;

MAGNETIC FIELD EFFECTS;

EID: 58149216716 PISSN: 15671739 EISSN: None Source Type: Journal
DOI: 10.1016/j.cap.2008.06.004 Document Type: Article

Times cited : (89)

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