Wide band gap Cd 0.83 Mg 0.15 Al 0.02 O thin films by pulsed laser deposition

Applied Surface Science

Volumn 255, Issue 8, 2009, Pages 4466-4469

  Gupta, R K ^a   Ghosh, K ^a   Patel, R ^a   Kahol, P K ^a  

^a MISSOURI STATE UNIVERSITY   (United States)

Author keywords

Aluminum oxide; Band gap; Cadmium oxide; Hall effect; Magnesium oxide; Mobility; Pulsed laser deposition

Indexed keywords

ALUMINA; ALUMINUM COATINGS; ALUMINUM OXIDE; CARRIER CONCENTRATION; CARRIER MOBILITY; ENERGY GAP; GROWTH TEMPERATURE; HALL EFFECT; HALL MOBILITY; MAGNESIA; PULSED LASER DEPOSITION; PULSED LASERS; THIN FILMS;

CADMIUM OXIDE; CDO THIN FILMS; ELECTRICAL CONDUCTIVITY; PREFERRED ORIENTATIONS; PULSED-LASER DEPOSITION TECHNIQUE; QUARTZ SUBSTRATE; VISIBLE REGION; WIDE BAND GAP;

CADMIUM COMPOUNDS;

EID: 58349116308     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.11.039     Document Type: Article

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